Next Generation In Situ DS Asher

In 2007 ibss Group began cooperating with an inventor of a unique, patented IC plasma source. In that time ibss developed and produced the GV10x, next generation in situ downstream asher. Competitively priced the GV10x Downstream Asher reduces carbon & hydrocarbon [HC] contamination 10 to 20 times more effectively than traditional methods at vacuum pressure safe for TMP operation.

Highlights:

Power - 5 to 99 watts continuously adjustable plasma power O⁰ or H⁰
Pressure - 2 Torr to <5 m Torr works at TMP speeds affords faster pump down after use

atomic specie's mean free path at rough pressure is short. This allows for de-contamination in near volume interactions
atomic specie's mfp at TMP pressures uniform chamber HC contamination mitigation reducing black scan squares in SEM images

Gentle - ashes gas phase hydrocarbons and surface carbon by non-kinetic process

The GV10x coupled to Gentle Asher™ Chamber can pre-clean specimens. Reports from customers claim that this combination mitigates carbon on TEM holders/specimens and SEM samples with less damage than high cost ‘plasma cleaners’. For less than ½ typical ‘plasma cleaner’, carbon contamination from SEM, FIB and TEM can be controlled as well.